2inch 3inch InP Laser Epitaxial Wafer Indium Phosphide epi Wafer Semiconductor Customize FP laser diode

Description of InP Laser Epitaxial Wafer:

Indium Phosphide (InP) is a key semiconductor material that enables optical systems to deliver the performance required for data center, mobile backhaul, metro, and long-haul applications. Lasers, photodiodes and waveguides fabricated on inP epitaxial wafers operate at the optimum transmission window of glass fiber, which enable eficient fiber communications.

InP laser epitaxial wafer is a specialized semiconductor substrate that consists of multiple layers of different materials grown on an indium phosphide (InP) wafer through epitaxial growth techniques. These additional layers are carefully engineered to create structures suitable for laser applications.

InP laser epitaxial wafers are crucial components in the fabrication of semiconductor lasers, including edge-emitting lasers and vertical-cavity surface-emitting lasers (VCSELs). The epitaxial layers are designed with specific optical and electrical properties to enable efficient light emission and amplification, making them essential in various optoelectronic devices for telecommunications, sensing, and other applications that require laser technology.

The character of InP Laser Epitaxial Wafer:

Optical Properties:
Emission Wavelength: Tunable emission wavelength in the infrared spectrum.
High Quantum Efficiency: Efficient light emission and amplification properties.
Low Absorption Coefficient: Allows for low optical losses within the material.
Structural Properties:
Layered Epitaxial Structure: Consists of multiple layers of different semiconductor materials grown on an InP substrate.
Smooth Surface: Uniform and defect-free surface crucial for laser performance.
Controlled Thickness: Each layer's thickness is precisely controlled for specific optical and electrical properties.
Electrical Properties:
Carrier Mobility: High carrier mobility for efficient charge transport.
Low Defect Density: Few crystal defects for enhanced electronic performance.
P-N Junction Formation: Ability to form p-n junctions for laser operation.
Thermal Properties:
High Thermal Conductivity: Efficient dissipation of heat generated during laser operation.
Thermal Stability: Maintains structural integrity under varying operating conditions.
Manufacturability:
Compatibility: Compatible with standard semiconductor fabrication processes.
Uniformity: Consistent properties across the wafer for mass production.
Customizability: Tailored epitaxial designs for specific laser applications.

Form of InP Laser Epitaxial Wafer:

Physical photo of InP Laser Epitaxial Wafer:

EPl layer default structure of InP Laser Epitaxial Wafe:

Application of InP Laser Epitaxial Wafer:

Laser Diodes: Suitable for edge-emitting lasers and VCSELs.
Telecommunications: Vital for optical communication systems.
Sensing and Imaging: Used in optical sensors and imaging applications.
Medical Devices: Employed in medical laser systems.

Application picture of InP Laser Epitaxial Wafer:

FAQ:

1.Q:What is an epitaxial wafer?
A:An epitaxial wafer (also called epi wafer, epi-wafer, or epiwafer) is a wafer of semiconducting material made by epitaxial growth (epitaxy) for use in photonics, microelectronics, spintronics, or photovoltaics.

2.Q:What are the advantages of InP?
A:The Distinct Advantages InP Wafers Offer:High Electron Mobility: InP exhibits electron mobility nearly ten times greater than silicon, making it perfect for high-speed transistors and amplifiers in telecommunications and radar systems.

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Key word: InP Laser Epitaxial Wafe; InP