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VGF 6 Inch N Type GaAs Semiconductor Substrate For Epitaxial Growth

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    Buy cheap VGF 6 Inch N Type GaAs Semiconductor Substrate For Epitaxial Growth from wholesalers
     
    Buy cheap VGF 6 Inch N Type GaAs Semiconductor Substrate For Epitaxial Growth from wholesalers
    • Buy cheap VGF 6 Inch N Type GaAs Semiconductor Substrate For Epitaxial Growth from wholesalers
    • Buy cheap VGF 6 Inch N Type GaAs Semiconductor Substrate For Epitaxial Growth from wholesalers
    • Buy cheap VGF 6 Inch N Type GaAs Semiconductor Substrate For Epitaxial Growth from wholesalers
    • Buy cheap VGF 6 Inch N Type GaAs Semiconductor Substrate For Epitaxial Growth from wholesalers
    • Buy cheap VGF 6 Inch N Type GaAs Semiconductor Substrate For Epitaxial Growth from wholesalers

    VGF 6 Inch N Type GaAs Semiconductor Substrate For Epitaxial Growth

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    Brand Name : ZMSH
    Model Number : S-C-N
    Certification : ROHS
    Price : BY case
    Payment Terms : T/T, Western Union
    Delivery Time : 2-6weeks
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    VGF 6 Inch N Type GaAs Semiconductor Substrate For Epitaxial Growth


    VGF 2inch 4inch 6inch n-type prime grade GaAs wafer for epitaxial growth


    GaAs wafer (Gallium Arsenide) is an advantageous alternative to silicon that has been evolving in the semiconductor industry. Less power consumption and more efficiency offered by this GaAs wafers are attracting the market players to adopt these wafers, thereby increasing the demand for GaAs wafer. Generally, this wafer is used to manufacture semiconductors, light emitting diodes, thermometers, electronic circuits, and barometers, besides finding application in the manufacturing of low melting alloys. As the semiconductor and electronic circuit industries continue to touch new peaks, the GaAs market is booming. Gallium arsenide of GaAs wafer has the power of generating laser light from electricity. Especially polycrystalline and single crystal are the two major type of GaAs wafers, which are utilized in the production of both the microelectronics and optoelectronics to create LD, LED, and microwave circuits. Therefore, the extensive range of GaAs applications, particularly in optoelectronics and microelectronics industry is creating a demand influx in the GaAs Wafer Market. Previously, the optoelectronic devices were mainly used on a broad range in short-range optical communications and computer peripherals. But now, they are in demand for some emerging applications such as LiDAR, augmented reality, and face recognition. LEC and VGF are two popular methods which are improving the production of GaAs wafer with high uniformity of electrical properties and excellent surface quality. Electron mobility, single junction band-gap, higher efficiency, heat and moisture resistance, and superior flexibility are the five distinct advantages of GaAs, which are improving the acceptance of GaAs wafers in the semiconductor industry.


    What we provide:

    Item
    Y/N
    Item
    Y/N
    Item
    Y/N
    GaAs crystal
    yes
    Electronic Grade
    yes
    N type
    yes
    GaAs blank
    yes
    Infrared Grade
    yes
    P type
    yes
    GaAs substrate
    yes
    Cell Grade
    yes
    Undoped
    yes
    GaAs epi wafer
    yes
    Specification detail:
    GaAs (Gallium Arsenide) for LED Applications
    ItemSpecificationsRemarks
    Conduction TypeSC/n-type 
    Growth MethodVGF 
    DopantSilicon 
    Wafer Diamter2, 3 & 4 inchIngot or as-cut available
    Crystal Orientation(100)2°/6°/15° off (110)Other misorientation available
    OFEJ or US 
    Carrier Concentration(0.4~2.5)E18/cm3 
    Resistivity at RT(1.5~9)E-3 Ohm.cm 
    Mobility1500~3000 cm2/V.sec 
    Etch Pit Density<500/cm2 
    Laser Markingupon request 
    Surface FinishP/E or P/P 
    Thickness220~350um 
    Epitaxy ReadyYes 
    PackageSingle wafer container or cassette 

    GaAs (Gallium Arsenide) ,Semi-insulating for Microelectronics Applications


    Item
    Specifications
    Remarks
    Conduction Type
    Insulating
     
    Growth Method
    VGF
     
    Dopant
    Undoped
     
    Wafer Diamter
    2, 3, 4 & 6 inch
    Ingot available
    Crystal Orientation
    (100)+/- 0.5°
     
    OF
    EJ, US or notch
     
    Carrier Concentration
    n/a
     
    Resistivity at RT
    >1E7 Ohm.cm
     
    Mobility
    >5000 cm2/V.sec
     
    Etch Pit Density
    <8000 /cm2
     
    Laser Marking
    upon request
     
    Surface Finish
    P/P
     
    Thickness
    350~675um
     
    Epitaxy Ready
    Yes
     
    Package
    Single wafer container or cassette
     
    No.ItemStandard Specification
    1Size2"3"4"6"
    2Diametermm50.8±0.276.2±0.2100±0.2150±0.5
    3Growth MethodVGF
    4DopedUn-doped, or Si-doped, or Zn-doped
    5Conductor TypeN/A, or SC/N, or SC/P
    6Thicknessμm(220-350)±20 or (350-675)±25
    7Crystal Orientation<100>±0.5 or 2 off
    OF/IF Orientation OptionEJ, US or Notch
    Orientation Flat (OF)mm16±122±132±1-
    Identification Flat (IF)mm8±111±118±1-
    8Resistivity(Not for
    Mechanical
    Grade)
    Ω.cm(1-30)´107, or (0.8-9)´10-3, or 1´10-2-10-3
    Mobilitycm2/v.s 5,000, or 1,500-3,000
    Carrier Concentrationcm-3(0.3-1.0)x1018, or (0.4-4.0)x1018,
    or As SEMI
    9TTVμm≤10
    Bowμm≤10
    Warpμm≤10
    EPDcm-2 8,000 or ≤ 5,000
    Front/Back SurfaceP/E, P/P
    Edge ProfileAs SEMI
    Particle Count<50 (size>0.3 μm,count/wafer),
    or AS SEMI
    10Laser MarkBack side or upon request
    11PackagingSingle wafer container or cassette

    Package Detail:


    Quality VGF 6 Inch N Type GaAs Semiconductor Substrate For Epitaxial Growth for sale
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