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6inch dia150mm SIC Wafer 4H-N Type Sic substrate for MOS device

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    Buy cheap 6inch dia150mm SIC Wafer 4H-N Type Sic substrate for MOS device from wholesalers
     
    Buy cheap 6inch dia150mm SIC Wafer 4H-N Type Sic substrate for MOS device from wholesalers
    • Buy cheap 6inch dia150mm SIC Wafer 4H-N Type Sic substrate for MOS device from wholesalers
    • Buy cheap 6inch dia150mm SIC Wafer 4H-N Type Sic substrate for MOS device from wholesalers
    • Buy cheap 6inch dia150mm SIC Wafer 4H-N Type Sic substrate for MOS device from wholesalers

    6inch dia150mm SIC Wafer 4H-N Type Sic substrate for MOS device

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    Brand Name : ZMKJ
    Model Number : 6inch 4h-n sic wafers
    Price : by case
    Payment Terms : T/T, Western Union, MoneyGram
    Supply Ability : 1-50pcs/month
    Delivery Time : 1-6weeks
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    6inch dia150mm SIC Wafer 4H-N Type Sic substrate for MOS device


    4h-n 4inch 6inch dia100mm sic seed wafer 1mm thickness for ingot growth

    Customzied size/2inch/3inch/4inch/6inch 6H-N/4H-SEMI/ 4H-N SIC ingots/High purity 4H-N 4inch 6inch dia 150mm silicon carbide single crystal (sic) substrates wafersS/ Customzied as-cut sic wafersProduction 4inch grade 4H-N 1.5mm SIC Wafers for seed crystal

    6inch SIC Wafer 4H-N Type production grade sic epitaxial wafers GaN layer on sic


    About Silicon Carbide (SiC)Crystal

    Silicon carbide (SiC), also known as carborundum, is a semiconductor containing silicon and carbon with chemical formula SiC. SiC is used in semiconductor electronics devices that operate at high temperatures or high voltages, or both.SiC is also one of the important LED components, it is a popular substrate for growing GaN devices, and it also serves as a heat spreader in high-power LEDs.


    1. Description
    Property4H-SiC, Single Crystal6H-SiC, Single Crystal
    Lattice Parametersa=3.076 Å c=10.053 Åa=3.073 Å c=15.117 Å
    Stacking SequenceABCBABCACB
    Mohs Hardness≈9.2≈9.2
    Density3.21 g/cm33.21 g/cm3
    Therm. Expansion Coefficient4-5×10-6/K4-5×10-6/K
    Refraction Index @750nm

    no = 2.61
    ne = 2.66

    no = 2.60
    ne = 2.65

    Dielectric Constantc~9.66c~9.66
    Thermal Conductivity (N-type, 0.02 ohm.cm)

    a~4.2 W/cm·K@298K
    c~3.7 W/cm·K@298K

    Thermal Conductivity (Semi-insulating)

    a~4.9 W/cm·K@298K
    c~3.9 W/cm·K@298K

    a~4.6 W/cm·K@298K
    c~3.2 W/cm·K@298K

    Band-gap3.23 eV3.02 eV
    Break-Down Electrical Field3-5×106V/cm3-5×106V/cm
    Saturation Drift Velocity2.0×105m/s2.0×105m/s

    SiC Applications

    Application areas

    • 1 high frequency and high power electronic devices Schottky diodes, JFET, BJT, PiN,
    • diodes, IGBT, MOSFET
    • 2 optoelectronic devices: mainly used in GaN/SiC blue LED substrate material (GaN/SiC) LED

    4 inch n-doped 4H Silicon Carbide SiC Wafer

    4H-N 4inch diameter Silicon Carbide (SiC) Substrate Specification

    6inch N-Type SiC Substrates Specifications
    PropertyP-MOS GradeP-SBD GradeD Grade
    Crystal Specifications
    Crystal Form4H
    Polytype AreaNone PermittedArea≤5%
    (MPD) a≤0.2 /cm2≤0.5 /cm2≤5 /cm2
    Hex PlatesNone PermittedArea≤5%
    Hexagonal PolycrystalNone Permitted
    Inclusions aArea≤0.05%Area≤0.05%N/A
    Resistivity0.015Ω•cm—0.025Ω•cm0.015Ω•cm—0.025Ω•cm0.014Ω•cm—0.028Ω•cm
    (EPD)a≤4000/cm2≤8000/cm2N/A
    (TED)a≤3000/cm2≤6000/cm2N/A
    (BPD)a≤1000/cm2≤2000/cm2N/A
    (TSD)a≤600/cm2≤1000/cm2N/A
    (Stacking Fault)≤0.5% Area≤1% AreaN/A
    Surface Metal Contamination(Al, Cr, Fe, Ni, Cu, Zn, Pb, Na, K, Ti, Ca ,V, Mn) ≤1E11 cm-2
    Mechanical Specifications
    Diameter150.0 mm +0mm/-0.2mm
    Surface OrientationOff-Axis:4°toward <11-20>±0.5°
    Primary Flat Length47.5 mm ± 1.5 mm
    Secondary Flat LengthNo Secondary Flat
    Primary Flat Orientation<11-20>±1°
    Secondary Flat OrientationN/A
    Orthogonal Misorientation±5.0°
    Surface FinishC-Face:Optical Polish,Si-Face:CMP
    Wafer EdgeBeveling
    Surface Roughness
    (10μm×10μm)
    Si Face Ra≤0.20 nm ; C Face Ra≤0.50 nm
    Thickness a350.0μm± 25.0 μm
    LTV(10mm×10mm)a≤2μm≤3μm
    (TTV)a≤6μm≤10μm
    (BOW) a≤15μm≤25μm≤40μm
    (Warp) a≤25μm≤40μm≤60μm
    Surface Specifications
    Chips/IndentsNone Permitted ≥0.5mm Width and DepthQty.2 ≤1.0 mm Width and Depth
    Scratches a
    (Si Face,CS8520)
    ≤5 and Cumulative Length≤0.5×Wafer Diameter≤5 and Cumulative Length≤1.5× Wafer Diameter
    TUA(2mm*2mm)≥98%≥95%N/A
    CracksNone Permitted
    ContaminationNone Permitted
    Edge Exclusion3mm

    CATALOGUE COMMON SIZE In OUR INVENTORY LIST

    4H-N Type / High Purity SiC wafer/ingots
    2 inch 4H N-Type SiC wafer/ingots
    3 inch 4H N-Type SiC wafer
    4 inch 4H N-Type SiC wafer/ingots
    6 inch 4H N-Type SiC wafer/ingots

    4H Semi-insulating / High Purity SiC wafer

    2 inch 4H Semi-insulating SiC wafer
    3 inch 4H Semi-insulating SiC wafer
    4 inch 4H Semi-insulating SiC wafer
    6 inch 4H Semi-insulating SiC wafer
    6H N-Type SiC wafer
    2 inch 6H N-Type SiC wafer/ingot
    Customzied size for 2-6inch

    >Packaging – Logistcs

    we concerns each details of the package , cleaning, anti-static , shock treatment .

    According to the quantity and shape of the product , we will take a different packaging process! Almost by single wafer cassettes or 25pcs cassette in 100 grade cleaning room.


    Quality 6inch dia150mm SIC Wafer 4H-N Type Sic substrate for MOS device for sale
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